Dependence of Channel Doping Concentration on Drain Induced Barrier Lowering for Asymmetric Double Gate MOSFET

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چکیده

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ژورنال

عنوان ژورنال: Journal of the Korea Institute of Information and Communication Engineering

سال: 2016

ISSN: 2234-4772

DOI: 10.6109/jkiice.2016.20.4.805